The 2nd Korea-Japan Joint Symposium for ARS & Capacitor

June 27-28, 2010

Prof. Soo-Gil Park

The 2nd Korea-Japan Joint Symposium for ARS & Capacitoris going to be held at Gyeongju, Korea, in coming June 27-28, 2010. We believe you can enjoy the conference and relax time in Gyeongju. The 2nd Korea-Japan Joint Symposium will provide an ideal opportunity for you to meet and share and exchange your ideas, experiences and expertise with your colleagues who related with anodizing and capacitor.

As you may know, we are proud of Gyeongju by its culture and history. An ancient city of the thousand-year Silla Kingdom, Gyeongju is a place where tombs and relics can be found in every part of the city and therefore is called a “roofless museum.”. Many historical artifacts and sites, including Bulguksa, Seokguram, Namsan, Wolsung, Daereungwon, Hwangryongsaji, and the Sanseong District, are registered on the UNESCO World Cultural Heritage list. Gyeongju will give you a great opportunity to enjoy the history, culture and dynamism of Gyeongju and provide youa most memorable and delighted experience. The organizing committeeof the 2nd Korea-Japan Joint Symposium for ARS & Capacitorcordially invite you to attend and participate in this meaningful conference. We look forward to seeing you in Gyeongju.

Contact:

Important date

April 30, 2010*1 Deadline for poster presentation (presentation title)

April 30, 2010*2 Deadline for early registration

May 25, 2010 Deadline for abstract submission

June 27-28, 2010 Symposium

*1 Please submit the title of poster presentation, authors names and their affiliation and e-mail address from ARS website (in comment column on top page)

*2 Please submit the participant name, title, affiliation, TEL and e-mail address from ARS website (in comment column on top page)

Website of ARS: http://www.ne.jp/asahi/ars/sfj/

Registration fee for Japanese

Regular fee : 50,000 JPY

Student fee : 30,000 JPY

*the registration fee covers accommodation (three nights from 26th June), breakfast, lunch, welcome reception, banquet, abstract booklet and coffee break.


Invited speakers from Japan

Professor Hideki Masuda (Tokyo Metropolitan Univ.)

“Fabrication of Site-Controlled Tunnel Pits on Al for Electrolytic Capacitors”

Dr Hirokazu Morita (Nippon Chemi-con Corp.)

"Capacitor Market Trend and Future Needs"

Dr. Tomoo Izumi (Cabot Supermetal Co. Ltd.)

“Recent progress on production of high CV tantalum powders”

Professor Kenichi Shimizu (Keio Univ.)

“Defects in niobium capacitors”

Professor Sachiko Ono (Kogakuin Univ.)

“Apatite coating on structurally modulated porous anodic films formed on valve metals”

Professor Hideki Kameyama (Tokyo University of Agriculture and Technology)

“Development of the methane steam reformer using the electrically heated alumite catalyst”

Dr. Masumi Nakai (Kyusyu Mitsui Aluminium Co. Ltd.)

“Thermal deformation in heat-treatment of aluminium anodic oxide film”

Professor Hiroki Habazaki (Hokkaido Univ.)

“Fabrication of superhydrophobic surface with dual scale pores”

Professor Hideaki Takahashi (Asahikawa National College of Technology)

“Fabrication of novel-type gravure printing rolls made of aluminum alloy”

Invited speakers from Korea

Dr. Chang-Soo Jin (The Korea Institute of Energy Research)

“The Preparation and Property of lithium-manganese oxide hybrid capacitor”

Dr. Seong-Mo Moon (The Korea Institute of Machinery and Materials)

“Anodizing of Al-Si alloys”

Prof. Yongsug Tak (Inha Univ.)

“Surfactant-assisted formation of anodic niobium oxide with nanoporous arrays”

Prof. Sun-Il Mho (Ajou Univ.)

“Inorganic/conducting polymer nanocomposite electrode materials for nano-enhanced LIB”