Background Statement for SEMI Draft Document 5890

Semiconductor Equipment and Materials International

3081 Zanker Road

San Jose, CA 95134-2127

Phone:408.943.6900, Fax: 408.943.7943

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Background Statement for SEMI Draft Document 5890

Revision to SEMI T7-0415

SPECIFICATION FOR BACK SURFACE MARKING OF DOUBLE-SIDE POLISHED WAFERS WITH A TWO-DIMENSIONAL MATRIX CODE SYMBOL

Notice: This background statement is not part of the balloted item. It is provided solely to assist the recipient in reaching an informed decision based on the rationale of the activity that preceded the creation of this Document.

Notice: Recipients of this Document are invited to submit, with their comments, notification of any relevant patented technology or copyrighted items of which they are aware and to provide supporting documentation. In this context, “patented technology” is defined as technology for which a patent has issued or has been applied for. In the latter case, only publicly available information on the contents of the patent application is to be provided.

Background

There are some issues to be resolved in SEMI T7-0415, so the revision is being proposed in this ballot. The points are as following:

SEMI M1:SPECIFICATIONS FOR POLISHED SINGLE CRYSTAL SILICON WAFERS has a close relation with SEMI T7. Because SEMI M1 was revised to add the definition of 450 mm wafer to the scope of SEMI M1-1014, SEMI T7 must be revised in order to maintain consistency with SEMI M1.
Location of the Data Matrix Code Symbol is specified in both SEMI T7 and SEMI M1 and other related silicon wafers SEMI Standards redundantly. Whenthe information of location is revised in SEMI M1 or other related silicon wafer SEMI Standards, the same revision must be made to SEMI T7 for the consistency.
Therefore, all the specifications about the locationmust be deleted from SEMI T7 to avoid redundancy.
After this revision, SEMI T7 will not need revision for any location changes..[m1]
Some other modifications are proposed.

Note that the items to be added to SEMI T7-0415areshown inunderlined blue textand the items to be deleted are shown in double strikethrough red texts, table and figure in this ballot.

This is a Draft Document of the SEMI International Standards program. No material on this page is to be construed as an official or adopted Standard or Safety Guideline. Permission is granted to reproduce and/or distribute this document, in whole or in part, only within the scope of SEMI International Standards committee (document development) activity. All other reproduction and/or distribution without the prior written consent of SEMI is prohibited.

Page 1Doc. 5890 SEMI

Semiconductor Equipment and Materials International

3081 Zanker Road

San Jose, CA 95134-2127

Phone:408.943.6900, Fax: 408.943.7943

hb khghgh1000A5890

The ballot results will be reviewed at the meetings indicated in the table below. Check under Calendar of Events for the latest update.

Information of TF Review and Committee Review

Task Force Review / Committee Review
Group: / Fiducial Mark Interoperability Task Force / JapanTC Chapter of Global TraceabilityTechnical Committee
Date: / TBD / Friday, December 18, 2015
Time & Time Zone: / TBD / 10:00-12:00 [JST]
Location: / TBD / Tokyo BigSight Conference Tower
City, State/Country: / TBD / Tokyo, Japan
Leader(s): / HirokazuTsunobuchi (Keyence) / Yoichi Iga (Freelance)
HirokazuTsunobuchi (Keyence)
Standards Staff: / Chie Yanagisawa (SEMI Japan)
81.3.3222.5863 / / Chie Yanagisawa (SEMI Japan)
81.3.3222.5863 /

Task Force Review meeting’s details are subject to change, and additional review sessions may be scheduled if necessary. Contact the task force leaders or Standards staff for confirmation.

If you need a copy of the documents in order to cast a vote, please contact the following person within SEMI.

Chie Yanagisawa

SEMI Standards, SEMI Japan

Tel: 81.3.3222.5863

Email:

Please be advised that voter requests for access to the full Standard must be made at least three business days before the voting deadline. Late requests may not be honored, and if the Standard is not available for this reason, the voter may not use this as justification for rejecting the ballot.

Page 1Doc. 5890 SEMI

Semiconductor Equipment and Materials International

3081 Zanker Road

San Jose, CA 95134-2127

Phone:408.943.6900, Fax: 408.943.7943

hb khghgh1000A5890

SEMI Draft Document 5890

Revision to SEMI T7-0415

SPECIFICATION FOR BACK SURFACE MARKING OF DOUBLE-SIDE POLISHED WAFERS WITH A TWO-DIMENSIONAL MATRIX CODE SYMBOL

1 Purpose

1.1 This Specification is intended to provide a marking symbology that can be used to mark silicon wafers with minimal intrusion into the fixed quality area of the wafer.

2 Scope

2.1 This Specification defines the geometric and spatial relationshipsshape, size and content (including the error checking and correcting code) of a rectangular two-dimensional (2-D), machine-readable, binary data matrix code symbol for back surface marking of double-side polished silicon wafers with diameters of 300 mm and 450 mm that comply with SEMIM1 and wafers of other materials with diameters of 300 mm and larger.[m2]

2.2 Although this Specification does not specify the marking techniques that may be employed when complying with its requirements, it is assumed that the symbol is obtained by laser scribing individual dots.

2.3 The matrix code is applicable to a broad range of wafer products including epitaxial wafers, SOI wafers, and unpatterned or patterned polished wafers. The format and algorithms of this code are based on two-dimensional symbology specified in ISO/IEC 16022.

NOTICE: SEMI Standards and Safety Guidelines do not purport to address all safety issues associated with their use. It is the responsibility of the users of the Documents to establish appropriate safety and health practices, and determine the applicability of regulatory or other limitations prior to use.

3 Referenced Standards and Documents

3.1 SEMI Standards and Safety Guidelines

SEMI M1 — Specifications for Polished Single Crystal Silicon Wafers

SEMI M12 — Specification for Serial Alphanumeric Marking of Silicon Wafers

3.2 ISO/IEC Standard[1]

ISO/IEC 16022 — International Symbology Specification – Data Matrix

NOTICE: Unless otherwise indicated, all documents cited shall be the latest published versions.

4 Terminology

4.1 Definitions

4.1.1 alignment bar, of a data matrix code symbol — a solid line of contiguous filled cells abutting a line of alternately filled and empty cells. [ISO/IEC 16022]

4.1.2 binary values — a dot in the wafer surface indicates the binary value 1. The absence of a dot, or a smooth surface surrounding a cell center point indicates the binary value 0.

4.1.3 border column — the outermost column of a data matrix code symbol. This column is a portion of the finder pattern.

4.1.4 border row — the outermost row of a data matrix code symbol. This row is a portion of the finder pattern.

4.1.5 cell, of a data matrix code symbol — the area within which a dot may be placed to indicate a binary value.

4.1.6 cell center point, of an array — the point at which the centerline of a row intersects the centerline of a column.

4.1.7 cell spacing, of an array — the (equal) vertical or horizontal distance between the cell center points of contiguous cells.

4.1.8 center line, of a row or column — the line positioned parallel to, and spaced equally between, the boundary lines of the row or column.

4.1.9 central area, of a cell — the area enclosed by a circle centered at the cell center point; used by code readers to sense the binary value of the cell.

4.1.10 data matrix code symbol — a two-dimensional array of square cells arranged in contiguous rows and columns. In certain ECC200 symbols, data regions are separated by alignment patterns. The data region is surrounded by a finder pattern. [ISO/IEC 16022]

4.1.11 dot — a localized region with a reflectance which differs from that of the surrounding surface.

NOTE 1:To assure reading efficiency, a minimum contrast of 30% is required between the reflectance value of a dot and the surrounding wafer surface. Various densitometers can provide such measurements nondestructively.

4.1.12 dot misalignment, within a cell — the distance between the physical center point of a dot and the cell center point.

4.1.13 finder pattern, of a data matrix code symbol — a perimeter to the data region. Two adjacent sides contain dots in every cell; these are used primarily to define physical size, orientation and symbol distortion. The two opposite sides are made up of cells containing dots in alternate cells. [ISO/IEC 16022]

4.1.14 quiet zone — a region outside the finder pattern that contains no discontinuities in surface characteristics.

4.1.15 reference point, of a data matrix code symbol — the physical center point of a corner cell common to the primary border row and the solid line of the alignment bar, used to identify the physical location of the symbol on the object being marked with the symbol.

NOTE 2:The reference point is at a fixed location on the object. Different cells may be chosen as the reference point depending on the desired orientation of the symbol on the object and the size variability of the symbol. The particular cell to be used as the reference point must be specified for each application.

5 Requirements

5.1 Shape and Size of the Data Matrix Code Symbol (see Figures 1 and 2)

5.1.1 Data Matrix Code Symbol Dimensions

5.1.1.1 Each rectangular matrix code symbol shall be composed of an array of 8 rows and 32 columns with an alignment bar as defined in ISO/IEC ISS 16022.

5.1.1.2 Cell spacing shall be 125 µm, center to center.

5.1.2 Dot Size — The nominal shape of the dot produced in the matrix may be circular or square. Its diameter or edge length (after polishing) shall be 100 µm + 10 µm − 20 µm.

5.1.3 Border Rows andColumns

5.1.3.1 One border row and one border column shall contain a dot in each cell. These are identified as the primary border row and the primary border column. These are used by the code reader to determine the orientation of the matrix.

5.1.3.2 The opposing (secondary) border row and column shall contain dots in alternating cells.

5.1.3.3 The quiet zone shall constitute a region at least the size of a cell immediately outside the border rows and columns.

5.1.3.4 For these rectangular matrix code symbols, the reference point of the symbol shall be the physical centerpoint of the cell common to the primary border row and the center alignment bar.

NOTE:The symbol means center line.

Figure 1
Data Matrix Field Dimensions
ECC200 - 8 rows × 32 columns

NOTE:The symbol means center line.

Figure 2
Data Matrix Code Fields
ECC200 - 8 rows × 32 columns

5.1.3.5 The maximum dot misalignment within a cell is 15 µm. This ensures that a minimum size dot covers a cell central area of radius 25 µm.

5.1.3.6 Adjacent dots shall not touch.

5.2 Content of the Data Matrix Code Symbol

5.2.1 Each rectangular matrix code symbol shall contain 10 message characters, together with the error checking and correcting (ECC200) code characters, encoded in accordance with ISO/IEC ISS 16022.

5.2.2 The message characters may include the following: A–Z, 0–9, and dash (–). These characters constitute the SEMI OCR Character Set except for the period (.); this is the same character set specified in SEMI M12. These characters are also included in the set designated as ‘primarily upper case alphanumeric’ in ISO/IEC 16022, in Table 5 and Annexe J. The ten message characters shall contain two elements:

a vendor-assigned 8-character wafer identification code, followed by
a[m3]2-character vendor identification code.[2]
Location of the Data Matrix Code Symbol(see Figure 3)is specified in SEMI M1.[m4]
With the wafer positioned back surface up and with the primary fiducial (notch) toward the operator, the origin of the data matrix code symbol shall be located as specified below.
The 8 row × 32 column rectangular 2-D matrix code symbol shall be placed so that the reference point is located at the radial distance as given in Table 1 from the center of the wafer and at 5.0 ± 0.1° counterclockwise from the orientation fiducial axis.
The primary row of the matrix code symbol shall be placed toward the periphery of the wafer.

Figure 3
Data Matrix Code Symbol Location on Back Surface of Wafer

Table 1 Distances from Data Matrix Code Symbol Location to Wafer Center

Nominal WaferDiameter / Distance to Center
300 mm / 148.95 ± 0.15 mm
450 mm / 223.95 ± 0.15 mm

NOTICE: SEMI makes no warranties or representations as to the suitability of the Standards and Safety Guidelines set forth herein for any particular application. The determination of the suitability of the Standard or Safety Guideline is solely the responsibility of the user. Users are cautioned to refer to manufacturer’s instructions, product labels, product data sheets, and other relevant literature, respecting any materials or equipment mentioned herein. Standards and Safety Guidelines are subject to change without notice.

The user’s attention is called to the possibility that compliance with this Standard or Safety Guideline may require use of copyrighted material or of an invention covered by patent rights. RVSI Acuity CiMatrix has filed a statement with SEMI asserting that the patented or copyrighted item can be used by the public for the purpose of implementing the Standard or Safety Guideline without specific license and without payment of royalty or other charge. Attention is also drawn to the possibility that some elements of this Standard or Safety Guideline may be subject to patented technology or copyrighted items other than those identified above. SEMI shall not be held responsible for identifying any or all such patented technology or copyrighted items. By publication of this Standard or Safety Guideline, SEMI takes no position respecting the validity of any patent rights or copyrights asserted in connection with any item mentioned in this Standard or Safety Guideline. Users of this Standard or Safety Guideline are expressly advised that determination of any such patent rights or copyrights and the risk of infringement of such rights are entirely their own responsibility.

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[1] International Organization for Standardization, ISO Central Secretariat, 1, ch. de la Voie-Creuse, CP 56, CH-1211 Geneva 20, Switzerland; Telephone: 41.22.749.01.11, Fax: 41.22.733.34.30,

[2] SEMI AUX001 — List of Vendor Identification Codes

[m1]バックグラウンド少し見直しました。

[m2]SEMI M1の後のSpace文字も消したい。

[m3]これは冠詞です。まあ、元々文章がおかしいのですが。。。

ただbはないです。

[m4]ここは追加ですので青アンダーライン