26460 Corporate Avenue

HAyward, CA94545, U.S.A.

510-780-2275

Bassam Shamoun

Education / 1990–1995 University of Wisconsin-Madison
Ph.D. Major: Engineering Physics
Minor: Computer Science
MS Engineering Physics
1986–1988 University of Baghdad
BS Engineering Physics
1982–1986 Science Technology Institute
BS Electrical Engineering
Research Interests / Advanced micro-lithography applications used for large-scale integrated circuits (ICs) design.
Industry Experience / 2000–present Applied Materials Company Santa Clara
Member of Technical Staff Advanced Technology Dept.
  • Provides leadership and technical guidance to project team members. Establish detailed project milestones, track project status, and provide consultations to industrial institutes.
  • Responsibilities also include design and integration precision mechanical and optical systems used in advanced semiconductor chip making technology. Participate in journal and conference publications.

1998-2000 Etec Systems, Inc. Hayward
Senior System Design Engineer Product Development Dept.
  • Identified products and product improvements through study, R&D, and customer contact. Monitored and kept abreast of related technology development in industry, government, and universities.
  • Conducted research in the area of optical micro-lithography, perform sub-system static and dynamic (structural/thermal/vibration) analyses. Developed models using finite-element techniques, designed engineering test stands and performed simulations and experiments in advanced technology laboratories.
  • Perform system verification and validation testing, evaluate hardware/software components and methods of implementation, recommend improvement and propose solutions. Specialized in system thermal management, precision motion and control.

Academic Experience / 1996–1998 Nano-Technology center, University of Wisconsin

Staff Scientist

Technical contributor and supervisor of academic projects funded by professional organizations such as Intel, IBM, Lucent, Applied Materials, etc. under SEMATECH National Consortium program agreement. The main objective of the program was to developed mask structures for next generation lithography used to manufacture the state-of-the-art computer chips.

Academic Experience (continued) / 1995–1996 University of Wisconsin-Madison Wisconsin
Post Doctorate,Nuclear Engr. & Engr. Physics Dept.
  • Developed a new optical diagnostic technique using 532nm green laser and images captured with high-speed CCD camera to study fuel-coolant interactions and improve fuel combustion in two-phase flow media. The same technique was used to study industry waste management and recycling products.
  • Designed and fabricated very high temperature ceramic furnaces (~2100 K), specified and tested refractory materials, and set requirements for designing instrumentation working at elevated temperatures environment.
  • Supervise graduate program and provide technical leadership to three graduate students.

1990-1995 University of Wisconsin-Madison Wisconsin Research Assistant
  • Developed models based on shock-wave theory and wrote software that simulates thermal interactions of fuel with water under severe conditions.
  • Modified and enhanced computer software packages for heat/mass transfer, and fluid dynamics.

1988–1990 Science Technology Institute
Teaching
(3 cr. Hrs) “System Control and Design”, 5th year course
(4 cr. Hrs): “Analog and Digital Electronic Laboratory” 4th year course
(3 cr. Hrs) Electricity and Magnetisms 4th year course
(3 cr. Hrs) heat & mass transfer courses. 4th year course
Participate in the development of undergraduate annual curriculum.
Patents Awards /
  1. US 6,424,879 B1 Jul. 23, 2002
  1. US 6,521,901 B1 Feb. 18, 2003

Other Awards
Accomplishments /
  • Sponsorship for MS and Ph.D. graduate study: US Department of Energy (DOE).
  • Graduation with high distinction
In a team of four, developed the first sub-micron raster multi-beam lithographic tool for advanced semiconductor chip making industry.
Publication /
  1. S. T. Coyle,a) B. Shamoun, J. Maldonado, M. Yu, D. Holmgren,b) X. Chen,b) T. Thomas,c) P. Allen, and M. Gesley, “Progress Toward a Raster Multi-Beam Lithography Tool. 47th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication, May 2003, Tampa, FL, U.S.A.
  2. Juan R. Maldonado, Steve Coyle, Bassam Shamoun, M. Yu and Piero Pianetta, “Cs HALIDE PHOTOCATHODE FOR MULTI-ELECTRON BEAM PATTERN GENERATOR”, 47th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication, May 2003, Tampa, Florida, U.S.A.
  3. S. T. Coyle,a) D. Holmgren,b) X. Chen,b) T. Thomas,c) A. Sagle, J. Maldonado, and B. Shamoun, “A Prototype Raster Multi-Beam Lithography Tool”, 46th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication, Los Angeles, U.S.A.
  4. David Crewe, Alon Litman, Ming Yu, Eugene Bullock, Bill DeVore, Jeff Sullivan, Harald Gross, Bassam Shamoun, Avner Karpol, Moshe Langer, “A Microcolumn for Electron Beam Inspection” APPLIED MATERIALS ET CONFERENCE, Aug. 2001, Santa Clara, CA. U.S.A.
  1. B. Shamoun “PHOTOMASK PATTERNING AND THE INFLUENCE OF SUBSTRATE BULK HEATING ON PLACEMENT ACCURACY,” International Conference for Micro and Nano-Engineering, Germany, Sept.2000.
  2. B. Shamoun, D. Trost, and Frank Chilese, “A predictive and Corrective Model for Bulk Heating Distortion in Photomasks,” to appear in proceedings of the 2000 SPIE symposium on Optical Microlithography XIII, U.S.A., 27 Feb. – 3 March 2000.
  3. B. Shamoun and D. Trost, “Experimental and Numerical Investigation of Photomask Substrate Heating during,” International Conference for Micro and Nano-Engineering, Italy, Sept.1999.
  4. V. Chakarian, F. Raymond III, C. A. Sauer, S. V. Babin, Robert Innes, A. L. Sagle, U. Hofmann, B. Shamoun, D. Trost, A. Ghanbari, F. E. Abboud, “System Architecture Choices for Advanced Mask Writer (100-130 nm),” 19th Annual Symposium on Photomask Technology, SPIE Vol. 3873, No. 6, pp. 228-242–3562, U.S.A., Sept. 1999.
  1. B. Shamoun et. al., “A practical View on the Assessment of Photomask Substrate Heating for 157nm Lithography,” 1st VUV workshop in Japan, July 9th, 1999.
  2. B. Shamoun, W. Trybula, R. Engelstad, and E. Lovell, “Effects of material properties on patterning distortions of optical reticles,” The 18th Annual Symposium on Photomask Technology and Management, Vol.3546, 214-220, U.S.A., Sept. 16-18, 1998.
  3. Shamoun B., Engelstad R., and David Trost, "Assessment of Thermal Loading-Induced Distortions in Optical Photomasks due to E-Beam Multipass Patterning," 42nd International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication, Chicago, U.S.A., May 26-29, 1998. Published in J. Vac. Sci. Technol. B 16(6), Nov/Dec 1998.
  1. B. Shamoun, M. Sprague, R. Engelstad, F. Cerrina, "PHOTOMASK IN-PLANE DISTORTION INDUCED DURING E-BEAM PATTERNING," SPIE's 23rd Annual International Symposium on Microlithography, Emerging Lithographic Technologies II, Vol. 3331, 275-279, Santa Clara, California, U.S.A., 22-27 February 1998.
  1. Shamoun B., M. Sprague, F. Bedford, R. Engelstad, and F. Cerrina, "X-RAY MASK DISTORTIONS DURING E-BEAM PATTERNING," 23rd Micro and Nano Enginering International Conference held in Athens, Greece, 23-25 February 1997. Published in the international Journal of Semiconductor Manufacturing Technology of MICROELECTRONIC ENGINEERING 41/42 (1998) 283-286.
  1. B. Shamoun, M. El.Beshbeeshy, R. Bonazza, "Light Extinction Technique for void fraction measurements in bubbly flow", Published in the Journal of Experiments in Fluids 26 (1999) 16-26. U.S.A.
  1. R. Bonazza and B. Shamoun, "Measurements of void fraction based on Mie scattering light attenuation in gas-liquid flows", SPIE's 42nd Annual Meeting, 27 July-1 August 1997, San Diego, California,U.S.A.
  1. Michael Meeks, Bassam Shamoun, Riccardo Bonazza, "Suppression Effects of Air Injection on Freon/Water Vapor Explosions for Small- and Large- Scale Geometries", Accepted for publication in the Journal of Nuclear Technology, 1998,U.S.A.
  1. Michael Meeks, Bassam Shamoun, Riccardo Bonazza, Michael Corradini, "Suppression of Stratified Explosive Interactions", OECD/CSNI Specialist Meeting on Fuel-Coolant Interactions (FCI), JAERI-Tokai, Japan, 19th-21st May, 1997,U.S.A.
  1. B. Shamoun, M. Corradini, "An experimental study of fuel-coolant interactions in freon-water and water-molten tin systems in stratified and injection geometries", NURETH 8 Conference, Kyoto, Japan, Sep. 30 -Oct. 4, 1997.
  1. B. Shamoun, R. Bonazza, "Measurements of Void Fraction in Transparent Two-Phase Flows by Light Extinction," OECD/CSNI Specialist Meeting on Advanced Instrumentation and Measurement Techniques, Dec. 31, 1996,U.S.A.
  1. Shamoun B., "Measurements of Void Fraction in a Vapor Explosion by Light Extinction Technique," Proceeding of the 20th International Symposium on Shock Waves, July 1995,U.S.A.
  1. Shamoun B., "Test Results and Analysis of Recent KROTOS FCI Experiments," National Heat Transfer Conference, Houston, Texas, U.S.A., August 1996.
  1. Shamoun B., Bonazza R., "Freon12-Water FCI In A Stratified Geometry With Gas Injection," National Heat Transfer Conference, Houston, Texas, U.S.A., August 1996.
  1. Shamoun B., Corradini M., "Analytical Study Of Subcritical Vapor Explosions," Published in the Journal of Nuclear Technology, Vol. 115, 35-45, July 1996,U.S.A.
  1. Shamoun B., Corradini M., "Supercritical Vapor Explosions: Comparisons Between Thermodynamic And Mechanistic Models," Published in the Journal of Nuclear Technology, Vol. 120, Nov. 1997,U.S.A.
  1. Corradini M., Shamoun B., Tang J., "TEXAS-V: Fuel-Coolant Interaction Model," Invited Paper: International Seminar of Heat and Mass Transfer in Severe Reactor Accidents, Cesme, Turkey, May 1995.
  1. Shamoun B., Corradini M., "Analysis Of Supercritical Vapor Explosions Using Thermal Detonation Wave Theory," Proceeding of NURETH-7, New York, U.S.A., September 1995.
  1. Shamoun B., Wit R., "Parametric Study Of Recriticality In A Boiling Water Reactor Severe Accident," Published in the Journal of Nuclear Technology, Vol. 107, 227-235, August 1994, U.S.A.

Personal Interests and Hobbies / Traveling, photography, reading, listening to music and playing tennis.
Professional Organization /
  • Member of International Society for Optical Engineering (SPIE).
  • Member of BACUS working groups