TECHNICAL SPECIFICATIONS – correction 1
Naročnik / Inštitut za kovinske materiale in tehnologijeLepi pot 11
1001 Ljubljana
Oznaka javnega naročila / JN/2017/1
Predmet javnega naročila / Vstični elektronski mikroskop
The subject of the tender is a new dual beam Field Emission Scanning Electron Microscope (FE-SEM) with Ga-ion Focused Ion Beam instrument (FIB), equipped with EDS and EBSD system for simultaneous data acquisition, together with installation and 6-year maintenance of the system; and an upright optical microscope for reflected light for material science, compatible with correlative microscopy with SEM.
1. Minimal requirements
REQUIREDA) Field Emission Scanning Electron Microscope (FE-SEM)
· Electron source: Schottky field emitter, guaranteed lifetime of at least 12 months
· Minimum accelerating voltage 500 V or lower
· Resolution – required:
o 1.7 nm at 1kV (SE mode)
o 0.9 nm at 30 kV (STEM mode)
· Imaging detectors (minimal configuration):
o Everhart-Thornley type detector for secondary electrons
o Retractable detector for backscattered electrons
o In-lens detectors for secondary and backscattered electrons
o STEM detector
o Configuration must allow simultaneous use of EDS and backscattered electron imaging by retractable detector
· The lenses of the microscope must allow imaging of magnetic samples with no stray magnetic fields, without any operator function (no special mode required for magnetic specimens, whether bulk or in the form of powders).
B) Stage and stage navigations:
· High vacuum chamber must fit at least a standard metallographic specimen (1 and 2 inch) and allow full manipulation for 3D studies by FIB, EDS and EBSD
· Fully motorized, at least 5-axis, stage controlled by computer – X, Y, Z, rotation, tilt (at least +70°)
· One click positioning to area of interest - with camera based navigation
C) Vacuum system:
· Airlock system for easy sample exchange
· Integrated plasma cleaner
D) Specimen holders:
· Must fit standard metallographic specimens (1 and 2 inch)
· Additional holder for transfer of samples from SEM to TEM must be provided
E) Software
· Software for correlative microscopy must be compatible across the provided optical microscope and scanning electron microscope.
· Software updates must be included for at least the duration of Maintenance agreement.
· Software for optical microscope, correlation microscopy and analytics must have at least one off-line licence
F) Hardware for SEM/FIB system
The offer must include the following for operation of the system
· Computer(s) necessary for full functionality of SEM system
· 3 Monitors 2 x (at least) 27” and 50” (to be mounted on the wall) for SEM
· Operation panel with contrast, brightness, focus, astigmatism…
· Table
· UPS providing 30 min support in the event of electricity blackout
· Water Chiller for closed cooling system of the column
G) FIB
· LMIS source, Ga ions
· Lifetime at least 1000 µAh
· In-situ lift out system for TEM lamella preparation
· Pt GIS source
· Ion beam resolution at least 4 nm at 30 kV
· Acceleration voltage from at least 1 kV to 30 kV
· Minimum probe current 10 pA or smaller
· Maximum probe current 60 nA or larger
I) Analytics:
Energy dispersive spectroscopy (EDS):
· Silicon drift detector, dry, no liquid nitrogen needed for operation
· At least 70 mm2 chip
· Software: point analysis, linescans, mapping, drift correction …
· Additional module for automatic particle analysis
Electron Backscattered Diffraction:
· speed at least up to 1400 indexed frames per second
· transmission EBSD (T-EBSD) option
· forward scattered detector (FSD)
· database of crystal structures
The EDS and EBSD system must be fully compatible and allow for simultaneous operation of the two. Possibility to perform 3D studies is also necessary.
J) Training and Maintenance
· Basic training at the installation on site (5 days)
· Advanced training for EDS/EBSD and 3D applications on site (2 days)
· 6-years service and maintenance contract for optical microscope and SEM-FIB consisting of at least:
o 1 preventative service visit per year, unlimited corrective visits with all labour costs (as necessary), basic consumables (3x FEG column, 3x LMIS Ga source, 3x replacement kit for FEG and source changes), 10 % discount for spare parts.
K) Optical microscope:
Microscope specifications:
· Stand with motorized stage focusing
· Motorised at least 6 position objective revolver with automatic recognition
· Objective revolver compatible with Nomarski/DIC/C-DIC… technique
· Infinity optics
· Microscope must allow imaging and observation in reflected light with following techniques: brightfield, darkfield, Nomarski/DIC/C-DIC.. and qualitative polarisation with lambda plate
· Binocular phototube, with oculars 10x with adjustable diopters and field of view at least 25
· objectives for reflected light: Plan fluorite objectives magnification, 5x - N.A. at least 0,13, 10x – N.A. at least 0,25, 20x – N.A. at least 0,45, Plan APO chromatic objectives 50x – N.A. at least 0,95, 100x (dry) – N.A. at least 0,95. All objectives must allow for brightfield, darkfield Nomarski/DIC/C-DIC.. and qualitative polarisation with lambda plate observations, except 50x and 100x where darkfield is not necessary.
Camera:
· High resolution CCD color camera at least 5 M pixels at least 14 bit digitalisation and chip size at least 2/3″. Integration time from 1 ms to at least 10 s., connected to a suitable computer with 4 TB RAID 10 disk and at least 27” monitor.
Software:
· Software for measurements of distances, areas, particle analysis, combining different fields of view in a single image, focus stacking, autofocus with at least one off-line licence.
· Software for material characterisation including: Automatic inclusion analysis, grain size analysis, phase analysis, grey cast iron… with at least one off-line licence.
# / Description / OFFERED
The tenderer describes in detail the technical data, quality, technical advantages, aesthetic and functional characteristics, accessibility, design, social, environmental and innovative features, after-sales services, technical assistance, delivery / performance conditions, etc. In accordance with the descriptions in the criteria (ePRO form - Instructions to tenderers, section 8)
Manufacturer:
Model:
1. / Resolution at 1 keV SE-mode:
2. / Resolution at 30 keV STEM-mode:
3. / Minimum E-beam energy achieved in the column (without sample bias, sample remains grounded):
4. / Analytical working distance (WD):
5. / Maximum probe current SEM:
6. / Minimum ion beam energy:
7. / Maximum ion beam probe current:
8. / Axis type:
9. / Stage movement:
10. / Maximum image size:
11. / Correlative Microscopy workflow between FIBSEM & Light Microscope:
12. / Analyitics:
EDS:
Silicon nitride window (yes or no) / Yes / no
EBSD
Triplet voting algorithm for indexation of patterns and confidence-index compatible for reliable data analysis (yes or no) / Yes / no
ADDITIONAL REQUIREMENT
Tenderers must also submit to the tender the manufacturer's technical specifications from which it is possible to confirm the above listed requirements.
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V/na , dne
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