EB - Advantest F7000S+VD02 - English Manual

Eric Lebrasseur (Mita Lab); Last revision 2014/03/20

  1. Flow chart
  • If your are the first user of the day, perform the daily check
  • Import BEF data.
  • Edit WEC file
  • Alignment if necessary (described in last chapter)
  • Setting substrate
  • Exposure
  • Removing substrate
  1. Daily check
  • Click “Job” button in main menu window at the bottom side of the screen.
  • Click “Run” tab in the Job window.
  • Start Mode > Auto
  • Type > PeriodCheck
  • Select “Daily” in the Check panel.
  • Click “Entry” button.
  1. Importing BEF data
  • Transfer your bef file to the workstation hard disk, in the directory “/home/eng/” with SFTP protocol.
  • Click “Data” button in Main Menu window at the bottom side of the screen.
  • Click “BEF” tab in the Job window ⇒Data(BEFLst) window is displayed.
  • File > Import > Select bef file > OK.
  1. WEC data

This is where you set parameters such as position and dose.

  • Click “Data” button in Main Menu window at the bottom side of the screen.
  • Click “WEC” tab in the Job window ⇒Data(WEC Edit) window is displayed.
  • Select a folder and a WEC file.
  • The WEC file is displayed in “Data Area” and “Wafer Map” windows.
  • Specify the parameters in each tabs :
  • Wafer tab : set wafer size
  • BEF tab : set BEF file name and layout
  • Dose tab : set nominal dose
  • Mode tab : set stage mode (SR or OTF)
  • Focus tab : set focus points file
  • Coarse tab : set position of coarse targets
  • Fine tab : set position of fine targets
  • File > Save as > Input WEC name > OK
  1. Setting substrate on adjustor

Set the Adjustor Set Table on a work bench.

Place the Adjustor on the Adjustor Set Table.

5.1.Wafer

There are several kinds of adjustors for wafer. Please use an appropriate adjustor corresponding to the sample type (size and thickness).

  • Place a wafer on the Adjustor and fix it.
  • Move the Wafer Contact Pinonto the wafer and tighten the screw.

Caution : Please tighten the screws after removing the wafer.

5.2.Photomask

  • Place the Photo Mask on the Adjustor using the Mask Hand Tool.
  • Push the photomask against the stoppers.
  • Push the fixing plates against the mask and tighten the screws.
  • Place the Contact Pin on the Photo Mask and tighten the screw to fix it.

Caution : Please tighten the screws after removing the photomask.

5.3.Chip

There are three locations to put chips, depending on the thickness of the chip according to illustration ⇒

The size of the chip can vary from 10x10mm to 30x30mm.

  • Place a chip and push it against the stoppers.
  • Fix the chip with copper tape.
  1. Setting adjustor on load port and removing
  • Check that ON/OFF state of lamps on the loader operation panel is the following ⇒
  • Press LOCK/UNLOCK button ⇒the button turns on and the door is unlocked.
  • Open the door and set/remove the adjustor on a BUF (1 or 2).
  • Check that the lamp of the BUF where the adjustor is set turns off.
  • Close the door
  • Press LOCK/UNLOCK button ⇒the door is locked and LOCK /UNLOCK button is flashing.
  1. Exposure
  • Click “Job” button in Main Menu window at the bottom side of the screen.
  • Click “Run” tab in Job window ⇒ExpJob window is displayed.
  • Job Name > selected automatically if Auto is selected at the right hand side of Job Name menu
  • Start Mode > Auto
  • Type > Exposure with Transfer
  • WEC Name > Click “Select” button > select the WEC file > OK
  • Port > Select load port > Adjustor
  • Check that the load port is ONLINE (door is locked)
  • If OFFLINE (door is not locked), push the LOCK/UNLOCK button on the control panel of the adjustor transfer equipment
  • BUF > select the Load port number (BUF) where the adjustor is set
  • Adjustor-ID > select adjustor ID
  • Click “Entry”⇒exposure job is registered in the queue and exposure process starts automatically
  1. Alignment

Precautions for learning new mark image :

  • Load a substrate wit alignment marks in the chamber before learning procedure.
  • We recommend that the substrate for learning procedure is not coated by resist.
  • Create WEC file data before learning procedure.
  • Click “Tool button” in Main Menu window.
  • Click “Alignment Tool” button in Tool window.
  • Click “WEC name” text box and select the WEC file.
  • Click “Load WEC” button
  • Focus Map (measure wafer height and set corrections; to do before learning new marks)
  • Capture image (to learn new mark image)
  • Edit Recipe (save the mark image as a recipe)
  • Coarse (OMD) (check coarse alignment by optical mark detection)
  • Coarse (EB) (check coarse alignment by electron beam )
  • Fine (check fine alignment by EB)

1